High Density and High Uniformity V Target-Vanadium Target-sputtering Target(Mat-cn)

V target Vanadium target(Mat-cn)

Physical properties

Color

silver

Density

6.11g/m3

Melting point

1902

Technical indicators

purity

99.9%

Relative density

>99%

Cut surface flatness

3.2Ra

Tolerance

±0.1mm

grain size

uniform

Material

V Vanadium

Brand

MAT-CN

Origin

Nanchang Jiangxi

Specifications

Size 01: diameter <360mm thickness> 1 mm (wafer / round table / rod)

Size 02: length <300mm width <300mm thickness> 1mm rectangular / sheet / step-like (splicing)

Size 03: outer diameter <360mm inner diameter> 1mm wall degree> 1 mm length> 1 mm (pipe / ring / rotatable targets)

Size 04 :: be customized according to user needs, sample processing, to map processing

Minimum order quantity

1, large concessions

Supply capacity

the same batch, the same material, continuous and reliable supply; 100 kg / month min

Delivery time

a single sheet of material 1 week delivery, bulk material 20 days -30 days delivery(working days)

Production process

vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining

Applicable instruments

various models magnetron sputtering equipment, etc.

Product uses

industrial-grade coating, experiments or research level V target , electronics, optoelectronics, military, decorative, functional film

Advantages

quality

1. reliability, price

2.restore Preparation of high purity, less impurities

3.Dense, rolling, oxidation, forming plasticizers

4.relatively high density, grain uniformity axis, consistency

Product accessories

formal quotation / purchase and sales contracts / packing list / material analysis detection of single / formal invoice

Packing vacuum

packaging / vacuum neutral packing / special packaging outside reinforcement package

Mode of transport for

UPS, DHL or FedEx or Ship(FOB/CIF)