Jewelry PVD coating machine/Ion plating machine for jewelry/watch/metal

Mode

Dimension

JTL-900

JTL-1100

JTL-1250

900*1000mm

1100*1000mm

1250*1100mm

Coating mode and main confirguration

Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets

Six multi-arc targets + a pair of twin (MF)magnetron sputtering targets

Twelve multi-arc targets + two sets of  plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets

Power source

Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.

Process gas control

Quality flowmeter + electromagnetism ceramic valve

Vacuum chamber structure

Vertical single(side) door, pump system postposition, double water-cooling

Vacuum system

Molecule pump +Roots pump +Mechanical pump(5.0*10^-5Pa)

Diffusion pump +Roots pump +Mechanical pump(5.0*10^-4Pa)

Workpiece baking temperature

Normal temperature to 350 centi-degree PID control, radiation heating.

Workpiece motion mode

Public rotation Frequency control: 0-20 rotation per minute

Measure mode

Number display composite vacuum gauge: from atmosphere to 1.0*10^-5Pa

Control mode

Manual/Automatic/PC/PLC + HMI/PC  four choice of control mode

Remark

We can design the dimension of the equipment according to customer’s special technique requirement.