PECVD system with mass flow meter

PECVD system with mass flow meter 

Application of PECVD SYSTEM 

PECVD systems are capable of depositing high quality SiO₂, Si₃N₄, or DLC films on up to 3” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal Gas Distribution. The platen can be biased with RF or Pulsed DC and it is heated resistively or cooled with chilled water circulation. The chamber is evacuated to low10^-7 torr pressure using 250 l/sec turbomolecular pump backed with 3.5 cfm mechanical pump. Standard unit comes with one inert gas, three reactive gas lines and four mass flow controllers. The planar Hollow Cathode Plasma source with its unique gas distribution system makes it possible to meet wide range of requirements such as plasma density, uniformity and separate activation of reactive species to cover the broadest possible deposition parameters

Featrues of PECVD SYSTEM  

1.Stainless steel RF power and Aluminum chamber furnace

2.Vacuum 10^-7torr range base pressure

3.RF shower head, Mircowave plasma sources

4.RF biased substrate houlder

5.Water cooled system

6.Heated platern up to 800 degree

7.Pneumatically controlled valves

8.PC controlled with lab view

9.Up to 4 MFC'S with vented box and gas manifolds

Technical parmaters of PECVD SYSTEM  

 Pictures show of PECVD SYSTEM  

Packaging of PECVD SYSTEM  

PLY WOOD BOX as below picture show. or as customer request.

Shipping and transportation

As customer request. Generally, Our mode of transport are as by sea, by air or rail transport

Payment

T/T, L/C, WEST UNION, PAYPAL, ESCROW AND ETC

Factory show

Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.

Contact information

Skype ID: jennyhao8819

Whatsapp/wechat/viber:008615639272359

Tel:0086-0371-55199322

Fax:0086-0371-86036875

Website:

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