Graphite preparation equipment best high efficiency furnace with plasma

Graphite preparation equipment best high efficiency furnace with plasma

Application of best high efficiency furnace

Plasma Enhanced Chemical Vapor Deposition tube furnace system (PECVD), which consists of 500W RF plasma source, 2"  or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump. The PECVD furnace is an ideal and affordable tool to deposit thin films or grow nano-wire from a gas state (vapor) to a solid state. 

Featrues of best high efficiency furnace

1.Lower temperature processing compared to conventional CVD. 
2.Film stress can be controlled by high/low frequency mixing techniques. 
3.Control over stoichiometry via process conditions.
4.Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and

Amorphous silicon (a-Si:H) deposition.

5.High vacuum system, maximum vacuum degree can reach: 4*10^-6Pa

Technical parmaters of best high efficiency furnace

 Pictures show of best high efficiency furnace

Packaging of best high efficiency furnace

PLY WOOD BOX as below picture show. or as customer request.

Shipping and transportation

As customer request. Generally, Our mode of transport are as by sea, by air or rail transport

Payment

T/T, L/C, WEST UNION, PAYPAL, ESCROW AND ETC

Factory show

Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.

Contact information

Skype ID: jennyhao8819

Whatsapp/wechat/viber:008615639272359

Tel:0086-0371-55199322

Fax:0086-0371-86036875

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