Home > Products > High-quality optoelectronic material > WTi10 WTi20 High Pure Tungsten Titanium Target
WTi10 WTi20 High Pure Tungsten Titanium Target
- chagnsha,shanghai
- T/T PayPal
- 30 days
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Product Details
| Brand Name | 4N-5N | Shape | round | |
| Application | High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells. | Chemical Composition | 99.99%-99.995% | |
| Dimensions | Diameter 150~350 Thickness 6~25 | Material | WTi |
Product Description
Application:
High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
Specification:
Name | Molecular formula | Specification | Size | Relative density | Grain size | Defect rate | |
| Tungsten target | W | 4N(99.99%) | Inch | mm | ≥99% | ≯50μm | 0 |
5N(99.999%) | D(6,8,10,12) H(0.25,0.5,0.75) | Diameter 150~350 Thickness 6~25 | |||||
| Tungsten Titanium Target | WTi10 WTi20 | 4N(99.99%) | ≥99% | ≯50μm | 0 | ||
4N5(99.995%) | |||||||
Contact Us
- Ultra Minor Metal Ltd
- Contact nameApple Chat Now
- Phone86-731-88590095
- AddressRm.101,Bldg.10, Xinggong Science and Technology Park, No.100 Luyun Rd.,Changsha High-tech Industrial Development Zone,, Changsha, Hunan
Product Categories
| High-quality optoelectronic material | Precious metal | Spherical | Nano powder | Rare metals |
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