50-250nm Mono Crystal Polishing Diamond Nano Powder

Features of Diamond Nano Powder

1. The shape of nano diamond dust particles is nearly spherical; With good wear resistance and hardness ;

2. With high specific surface area and porous structure ;

3. High thermal stability, excellent thermal conductivity ;

4. With unique corrosion resistance ;

5. Ultra-high purity, the total amount of various metal impurities is stable at ppm level. Purification and surface modification for different needs make the surface functional groups controllable ;

6. Unique surface modification makes it have good stability and dispersibility in water-based, oil-based and other conditions ;

7. Mature and stable grading technology makes our products suitable for various applications with strict requirements for particle size distribution ;

8. All series of products are suitable for different industries .

Application of Diamond Nano Powder

With a wide range of applications in aerospace, aircraft manufacturing, precision machinery, optical instruments, automobile manufacturing and other industries :

1. A kind of good polishing agents, which can obtain atomic polished surface after polishing. It is specially used for finishing and polishing of fine ceramics, integrated circuit chips, gemstones, ferrite heads, quartz sheets, super hard alloys, optical lenses and other hard materials ;

2. Electroplating and Non-electroplating with high hardness and wear resistance ;

3. Metal composites with high hardness and wear resistance ;

4. Low friction, low wear, high load, long life lubrication systems (such as lubrication of various cylinders) and super lubricants ;

5. PTFE matrix composites with high wear resistance and good lubrication ;

6. It is an irreplaceable material for producing polycrystalline diamond and diamond films ;

7. It is the main material for thermal infiltration of nano-diamond ;

8. Can be used for the modification of metallic materials ;

Nano-diamond is with excellent wear resistance, corrosion resistance and thermal conductivity, which can be used for super-mirror polishing of drawing die, mirror polishing of crystal and silicon wafer. Meantime, it is with ultra-high purity, super-clean polishing effect, its main impurity content is below 1 ppm, surface roughness below 0.8 nm.