Ground , Machining Molybdenum Sputtering Target / Mo Target For Sputtering Coating / Pvs

99.95% Pure Molybdenum Sputtering Target Mo Target For Sputtering Coating / Pvs

Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc..

Because of its?resistant to high temperature and corrosion, molybdenum sputtering targets are widely used in petroleum chemical industry, aviation, machine manufacturing, and electronics semiconductor industries and so on.

Molybdenum target is mainly used in plasma sputtering industry. With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.

We provide molybdenum target that made with molybdenum powder which purity is 99.95%. High quality products have been made after decades of procedures such as pressing, sintering, rolling, cutting and surface grinding. Super sputtering target (single heavy reach to 120kg) is available at present.

Mo?Target?Description:

Purity: Mo≥99.95%
Density: more than 10.1g/cm3
Supply state: Surface polishing, CNC machine processing
Quality standard: GB/T 3876-2007

Sizes Of Sputtering Target:

Rotary target:?170mm outer diameter, 1500mm length

Planar target:?2mm-30mm thickness , up to 600mm width, up to 1800mm length

Disc and Rod:?up to 300mm diameter

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Testing Report of Pure Molybdenum Material:

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