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sputtering titanium aluminium plate target
US$ 15 - 40
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Product Details
| Place of Origin | Shaanxi, China | Brand Name | OY | |
| Model Number | sputtering titanium aluminium plate target | Application | industry | |
| Technique | polish | Dimensions | as your need | |
| Grade | Ti Al | Powder Or Not | Not Powder | |
| Ti Content (%) | ≥99.5% |
Product Description
sputtering titanium aluminium plate target
sputtering titanium aluminium plate target
| Item | Product name | Manufacturing method | Product size | Relative density |
| 1 | Chromium Target | hot isostatic pressing(HIP) | maximum size1200*250mm | >99.0% |
| 2 | Titanium Target | smelting | maximum size500*300mm | >98.0% |
| 3 | Niobium Target | hot isostatic pressing(HIP) | maximum size1200*250mm | >98.0% |
| 4 | Cr-Al Target | hot isostatic pressing(HIP) | maximum size1200*250mm | >98.0% |
| 5 | Ti-Al Target | hot isostatic pressing(HIP) | maximum size1200*250mm | >99.0% |
| 6 | Si-Al Target | hot isostatic pressing(HIP) | maximum size1000*200mm | >99.0% |
| 7 | Cr-Si Target | hot isostatic pressing(HIP) | maximum size800*180mm | >96.0% |
| 8 | W-Ti Target | hot isostatic pressing(HIP) | maximum size800*180mm | >99.0% |
| 9 | Ni-Cr Target | The vacuum melting, forging and rolling | maximum size500*300mm | >98.0% |
| 10 | molybdenum alloy | hot isostatic pressing(HIP) | maximum size800*180mm | >99.0% |
| 11 | Tubulose Target | hot isostatic pressing(HIP) | Length<1.2m,Outside<300mm | >96.0% |
sputtering titanium aluminium plate target
| Item | Product name | Purity | Grain size | Conventional proportions | Product Advantage |
| 1 | Chromium Target | 99.5%-99.95%(2N5-3N5) | <100μm | High purity, high density, fine and uniform grain size, low oxygen content. | |
| 2 | Titanium Target | 99.5%-99.99%(2N5-4N) | <180μm | ||
| 3 | Niobium Target | 99.5%-99.95%(2N5-3N5) | <100μm | ||
| 4 | Cr-Al Target | 99.5%-99.95%(2N5-3N5) | <100μm | Cr-70Al,Cr-50Al,Cr-30Al(at%) | |
| 5 | Ti-Al Target | 99.5%-99.95%(2N5-3N5) | <100μm | Ti-30Al,Ti-50Al,Ti-67Al,Ti-70Al(at%) | |
| 6 | Si-Al Target | 99.5%-99.95%(2N5-3N5) | <50μm | Si-10Al,Si-30Al,Si-50Al (wt%) | |
| 7 | Cr-Si Target | 99.5%-99.95%(2N5-3N5) | <100μm | Cr-50Si(wt%) | |
| 8 | W-Ti Target | 99.5%-99.95%(2N5-3N5) | <100μm | W-10Ti(wt%) | |
| 9 | Ni-Cr Target | 99.5%-99.99%(2N5-4N) | <150μm | Ni-20Cr(wt%) | |
| 10 | molybdenum alloy | 99.5%-99.95%(2N5-3N5) | <100μm | ||
| 11 | Tubulose Target | 99.5%-99.95%(2N5-3N5) | <50μm | Cr,Ti,Al,Nb,TiAl,SiAl,Mo alloy,CrAl,NiCr,CrTi,TiSi and so on. | Produce large aspect ratio, one-piece tubular target. Compared with planar targets, which has a uniform and fine grain size, high utilization of materials, coatings good continuity, uniform and dense coating composition and so on. |
sputtering titanium aluminium plate target
sputtering titanium aluminium plate target
sputtering titanium aluminium plate target
Contact Us
- Baoji Oyuan Metal-Tech Co., Ltd.
- Contact nameJianfeng Guo Chat Now
- Phone86-917-3296800
- AddressTaicheng Road, Baoji, Shaanxi
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