Home > Products > plasma cleaner > 13.56MHz Plasma Cleaning Equipment /Poly Plasma Etcher for Silicon Wafer
13.56MHz Plasma Cleaning Equipment /Poly Plasma Etcher for Silicon Wafer
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Product Details
| Condition | New | Place of Origin | China | |
| Brand Name | CY | Model Number | CY-P10L-B | |
| Feature | Critical Cleaning / Residue Free | Fuel | Other, gas | |
| Certification | CE | Use | Other | |
| Cleaning Process | Other, gas | Cleaning Type | Other, plasma cleaning | |
| Industry Used | Electronic Industry | Material | Glass / Ceramic | |
| Power(W) | 200W |
Product Description
13.56MHz plasma cleaning equipment /Poly plasma etcher for silicon wafer
Technical parameters of Poly plasma etcher
| Model no. | CY-P10L-B | CY-P5L-A | CY-P2L-A | CY-P2L-B |
| Display | LCD touch screen | LED button screen | ||
| Power supply | AC 220V 50Hz | |||
| Working current | plasma cleaner working current less than 1.2A | |||
| Radio frequency power | 100-400w, adjustable | < 200w, adjustable, or customized | ||
| RF frequency | 13.56MHz(offset less than 0.4KHz) | 40KHz(offset less than 0.2KHz) | ||
| Characteristic impedance | 50 Ohm,automatch | |||
| Chamber capacity | 10L | 5L | 2L | 2L |
| Vacuum degree | 60Pa-100Pa | 10Pa-100Pa | 30Pa-100Pa | 10Pa-1000Pa |
| Cleaning time | 1~6000ml adjustable | |||
| Gas flow speed | 10~100ml | |||
| Control mode | Manual control or Programmable control | |||
| Vacuum pump | CY-4C | |||
| Vacuum chamber temper. | less than 65℃ | |||
| Cooling type | forced air cooling | |||
| Equipment list | plasma cleaner:1set; vacuum pump: 1set; vacuum high-pressure hose: 1pc;O type card: 4pcs;protective tube(0.2A,1.5A): each 3pcs. | |||
Application of Poly plasma etcher
1.Car industry: ignition coil engine oil seal film
2.Defense industry: Aerospace electrical connectors,Kevlar deal
3.Electronics industry: hard plastic parts, earphone, Cell phone cover
4.Medical industry: intravenous infusion, catheter treatment
5.Textile fiber,rubber and plastic industry and etc
6. Subminia-ture Tube cleaning
Features of Poly plasma etcher
1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more new features;
5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed.
Display of Poly plasma etcher
Packaging of Poly plasma etcher
PLY WOOD BOX as below picture show. or as customer request.
Zhengzhou CY Scientific Instrument Co.,Ltd is the real manufacturer whom is engaged in lab heat treatment equipment. Our main products include: tube furnace, muffle furnace, dental furnace, vacuum furnace, atmosphere furnace, mass flow controller, plasma cleaner and etc. We have separately R&D department, can do customized heat treatment equipment. Welcome you come to visit us.
Skype ID: jennyhao8819
Whatsapp/wechat/viber:008615639272359
Tel:0086-0371-55199322
Fax:0086-0371-86036875
Website:
We are always at your service within 24 hours
Contact Us
- Zhengzhou CY Scientific Instrument Co., Ltd.
- Contact nameJibin Wang Chat Now
- Phone86-371-55199322
- Addresscuizhu road, hi-tech zone, Zhengzhou, Henan
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13.56MHz Industrial Plasma Etcher With Vacuum Pump/Laboratory Gas Plasma Etcher
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