Zhengzhou CY Scientific Instrument Co., Ltd.: Zhengzhou, Henan, China; Main products: Lab muffle furnace, Tube furnace, CVD system, Plasma Cleaner, Dental zirconia furnace

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Home > Products > CVD system > SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition used PECVD system equipment

SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition used PECVD system equipment

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USD $5,090 - $25,980 / Set

1 Set(Min.Order)

Supply Ability 500 Set / Sets per Month
Port China port
Payment TermsT/T Credit Card

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Product Details

Brand Name	CYKY		Model Number	CYKY-PECVD
Place of Origin	Henan, China

Product Description

SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition used PECVD system equipment

Brief introduction of the PECVD system:

CYKY-PECVD is a CE certified compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 2" or 3.14" O.D optional split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump. The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nano-wire from a gas state (vapor) to a solid state, and benefits:

Lower temperature processing compared to conventional CVD.
Film stress can be controlled by high/low frequency mixing techniques.
Control over stoichiometry via process conditions.
Offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

Specification of the PECVD system

Split Tube furnace	1200^oC Max. working temperature for < 60 minutes 1100^oC Max for continuous heating 30 segments programmable precision digital temperature controller 440 mm length single heating zone and 150 mm length constant temperate zoneHigh purity quartz tube optional from ( click optional bar to choose ) One pair of vacuum sealed flange with valves 2"OD x 1.7"ID x 48" Length 3.14"OD x 2.83"ID x 48'' Length Input power: 208 – 240V AC input, single phase at max. 4KW Two zone split tube furnace is optional at extra cost
Plasma RF Power Supply	Output Power: 5 -500W adjustable with ± 1% stability RF frequency: 13.56 MHz ±0.005% stability Reflection Power: 200W max. Matching: Automatic RF Output Port: 50 Ω, N-type, female Noise: <50 dB. Cooling: Air cooling. Power : 208-240VAC, 50/60Hz Note: This RF power supply can accept 50 - 80 mm Max. quartz tube by changing flange
Anti-corrosive Pressure Gauge	3.8x10^-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent
Vacuum Pump and valve	Heavy Duty Rotary Vane Vacuum Pump with Two Stage Exhaust Systeminstalled in bottom case with max. vacuum pressure 10^-2 torr. KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve Digital vacuum pressure gauge and display are installed with the furnace
Mass Flow meters	Four precision mass flow meters (0.02% accuracy) with digital display are installed on the bottom case to control gas flow rate automatically. MFC 1: Gas flow range from 0~100 sccm MFC 2&3: Control range from 0~200 sccm MFC 4: Control range from 0~500 sccm One gas mixing tank is installed on bottom case with liquid release valve 4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually Gas inlet fitting: four 1/4NPS Gas outlet fitting: four 1/4NPS
Overall dimensions	Furnace: 550mm(L) x 380mm(W) x 520mm(H) 2 Bottom Mobile case together: 1200mm(L) x 1200mm(W) x 1200mm(H) Net weight: 220 lbs Shipping weight: 350 lbs
Warranty	One year limited warranty

Detailed photos of the PECVD system:

PECVD System with sliding tube furnace for fast heating & cooling.

sliding tube furnace

Contact Us

Zhengzhou CY Scientific Instrument Co., Ltd.: Contact nameJibin Wang
Chat Now; Phone86-371-55199322; Addresscuizhu road, hi-tech zone, Zhengzhou, Henan

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SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition used PECVD system equipment

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